industrial Advanced Activated Carbon Filter

In wafer fabrication, the purification of process gases and liquids toparts-per-trillion levels of contamination is mission critical. To meetstringent purity specifications, more advanced activated carbon filtersare essential.

Activated carbon filters must scrub trace molecular, ionic and particulateimpurities from carrier gases whether supplying deposition reactors oretching/stripping chambers. That allows uniform, defect-free thin filmsto be formed on each successive silicon wafer. These filters are alsoused for climate control systems to maintain sub-ppb purity, even inplanetary-scale cleanroom installations.

Activated carbon filters are used in photolithography to polish solventsfor spin-coating and developing photoresist. They take off any organicresidues that may interfere with the resolution of light exposure or theconformity of etching. Filters are also used in resist stripping baths forregeneration and discharge, preventing degradation of thereplenishment fluid.

Material purity in semiconductor device packaging is no less demanding.Activated carbon filters are used to purify encapsulation gel flush gasesand plating baths. They remove molecular contamination that threatensinterconnect reliability or tropography uniformity. Rinse and processwater is conditioned using carbon filters and ion exchange resins incombination.